Author: Joseph I. Goldstein
Publisher: Springer
ISBN: 1493966766
Category : Technology & Engineering
Languages : en
Pages : 554
Book Description
This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to "read it all" to understand a topic Includes an online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3
Eighth International Congress on X-ray Optics and Microanalysis
Author: Donald Robert Beaman
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 690
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 690
Book Description
Scanning Electron Microscopy and X-Ray Microanalysis
Author: Joseph Goldstein
Publisher: Springer Science & Business Media
ISBN: 1461502152
Category : Technology & Engineering
Languages : en
Pages : 708
Book Description
This text provides students as well as practitioners with a comprehensive introduction to the field of scanning electron microscopy (SEM) and X-ray microanalysis. The authors emphasize the practical aspects of the techniques described. Topics discussed include user-controlled functions of scanning electron microscopes and x-ray spectrometers and the use of x-rays for qualitative and quantitative analysis. Separate chapters cover SEM sample preparation methods for hard materials, polymers, and biological specimens. In addition techniques for the elimination of charging in non-conducting specimens are detailed.
Publisher: Springer Science & Business Media
ISBN: 1461502152
Category : Technology & Engineering
Languages : en
Pages : 708
Book Description
This text provides students as well as practitioners with a comprehensive introduction to the field of scanning electron microscopy (SEM) and X-ray microanalysis. The authors emphasize the practical aspects of the techniques described. Topics discussed include user-controlled functions of scanning electron microscopes and x-ray spectrometers and the use of x-rays for qualitative and quantitative analysis. Separate chapters cover SEM sample preparation methods for hard materials, polymers, and biological specimens. In addition techniques for the elimination of charging in non-conducting specimens are detailed.
Scanning Electron Microscopy and X-Ray Microanalysis
Author: Joseph I. Goldstein
Publisher: Springer
ISBN: 1493966766
Category : Technology & Engineering
Languages : en
Pages : 554
Book Description
This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to "read it all" to understand a topic Includes an online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3
Publisher: Springer
ISBN: 1493966766
Category : Technology & Engineering
Languages : en
Pages : 554
Book Description
This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to "read it all" to understand a topic Includes an online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3
Synchrotron Radiation Research
Author: Herman Winick
Publisher: Springer Science & Business Media
ISBN: 1461579988
Category : Medical
Languages : en
Pages : 767
Book Description
This book has grown out of our shared experience in the development of the Stanford Synchrotron Radiation Laboratory (SSRL), based on the electron-positron storage ring SPEAR at the Stanford Linear Accelerator Center (SLAC) starting in Summer, 1973. The immense potential of the photon beam from SPEAR became obvious as soon as experiments using the beam started to run in May, 1974. The rapid growth of interest in using the beam since that time and the growth of other facilities using high-energy storage rings (see Chapters 1 and 3) demonstrates how the users of this source of radiation are finding applications in an increasingly wide variety of fields of science and technology. In assembling the list of authors for this book, we have tried to cover as many of the applications of synchrotron radiation, both realized already or in the process of realization, as we can. Inevitably, there are omissions both through lack of space and because many projects are at an early stage. We thank the authors for their efforts and cooperation in producing what we believe is the most comprehensive treatment of synchrotron radiation research to date.
Publisher: Springer Science & Business Media
ISBN: 1461579988
Category : Medical
Languages : en
Pages : 767
Book Description
This book has grown out of our shared experience in the development of the Stanford Synchrotron Radiation Laboratory (SSRL), based on the electron-positron storage ring SPEAR at the Stanford Linear Accelerator Center (SLAC) starting in Summer, 1973. The immense potential of the photon beam from SPEAR became obvious as soon as experiments using the beam started to run in May, 1974. The rapid growth of interest in using the beam since that time and the growth of other facilities using high-energy storage rings (see Chapters 1 and 3) demonstrates how the users of this source of radiation are finding applications in an increasingly wide variety of fields of science and technology. In assembling the list of authors for this book, we have tried to cover as many of the applications of synchrotron radiation, both realized already or in the process of realization, as we can. Inevitably, there are omissions both through lack of space and because many projects are at an early stage. We thank the authors for their efforts and cooperation in producing what we believe is the most comprehensive treatment of synchrotron radiation research to date.
Current Catalog
Author: National Library of Medicine (U.S.)
Publisher:
ISBN:
Category : Medicine
Languages : en
Pages :
Book Description
First multi-year cumulation covers six years: 1965-70.
Publisher:
ISBN:
Category : Medicine
Languages : en
Pages :
Book Description
First multi-year cumulation covers six years: 1965-70.
Scanning Electron Microscopy
Author:
Publisher:
ISBN:
Category : Electron microscopy
Languages : en
Pages : 458
Book Description
Vols. for 1968-77 include the proceedings of the annual Scanning Electron Microscope Symposium, sponsored by the IIT Research Institute, and other workshops.
Publisher:
ISBN:
Category : Electron microscopy
Languages : en
Pages : 458
Book Description
Vols. for 1968-77 include the proceedings of the annual Scanning Electron Microscope Symposium, sponsored by the IIT Research Institute, and other workshops.
Use of Monte Carlo Calculations in Electron Probe Microanalysis and Scanning Electron Microscopy
Author: Kurt F. J. Heinrich
Publisher:
ISBN:
Category : Electron probe microanalysis
Languages : en
Pages : 180
Book Description
Publisher:
ISBN:
Category : Electron probe microanalysis
Languages : en
Pages : 180
Book Description
Vth International Congress on X-Ray Optics and Microanalysis / V. Internationaler Kongreß für Röntgenoptik und Mikroanalyse / Ve Congrès International sur l’Optique des Rayons X et la Microanalyse
Author: Gottfried Möllenstedt
Publisher: Springer Science & Business Media
ISBN: 3662121085
Category : Science
Languages : en
Pages : 624
Book Description
The Fifth International Congress on X-Ray Optics and Microanalysis was organized by the Institute of Applied Physics at Tübingen University in Western Germany from September 9th through 14th, 1968. Since 1956, when the First Conference was arranged in Cambridge, England by one of the pioneers in this field, V. E. CossLETT, the experts in the fields of X-Ray Optics and Microanalysis have met every third year to exchange their scientific experiences. Later meetings were held at Uppsala, Sweden in 1959, at Stanford, California in 1962, and at Orsay, Francein 1965. The participants in the 1968 Conference came from the following countries: Germany 140, France 60, Great Britain 55, USA 20, Netherlands 16, Switzerland 12, Austria 9, Sweden 7, Belgium 6, Japan 5, Italy 4, two each from Israel, Yugoslavia, Canada, Norway, Hungary and one each from Argentine, Poland, South Africa. As at the latest congress in Paris the following central topics were treated: General problems of X-ray optics, physical bases of electron beam microanalysis, quantitative problems of X-ray microanalysis, instrumentation, microdiffraction, applications to metal lurgy, mineralogy, and biology. An exhibition showing some of the most modern instruments formed an important part of the conference. The Springer-Verlag, Heidelberg, deserves thanks for the careful and speedy work they have performed in printing these conference proceedings. We are further indebted to all contributors of this volume for their kind cooperation. Tübingen, August 1969 G. MöLLENSTEDT and K. H.
Publisher: Springer Science & Business Media
ISBN: 3662121085
Category : Science
Languages : en
Pages : 624
Book Description
The Fifth International Congress on X-Ray Optics and Microanalysis was organized by the Institute of Applied Physics at Tübingen University in Western Germany from September 9th through 14th, 1968. Since 1956, when the First Conference was arranged in Cambridge, England by one of the pioneers in this field, V. E. CossLETT, the experts in the fields of X-Ray Optics and Microanalysis have met every third year to exchange their scientific experiences. Later meetings were held at Uppsala, Sweden in 1959, at Stanford, California in 1962, and at Orsay, Francein 1965. The participants in the 1968 Conference came from the following countries: Germany 140, France 60, Great Britain 55, USA 20, Netherlands 16, Switzerland 12, Austria 9, Sweden 7, Belgium 6, Japan 5, Italy 4, two each from Israel, Yugoslavia, Canada, Norway, Hungary and one each from Argentine, Poland, South Africa. As at the latest congress in Paris the following central topics were treated: General problems of X-ray optics, physical bases of electron beam microanalysis, quantitative problems of X-ray microanalysis, instrumentation, microdiffraction, applications to metal lurgy, mineralogy, and biology. An exhibition showing some of the most modern instruments formed an important part of the conference. The Springer-Verlag, Heidelberg, deserves thanks for the careful and speedy work they have performed in printing these conference proceedings. We are further indebted to all contributors of this volume for their kind cooperation. Tübingen, August 1969 G. MöLLENSTEDT and K. H.
Nuclear Science Abstracts
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 1212
Book Description
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 1212
Book Description
NBS Special Publication
Author:
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 726
Book Description
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 726
Book Description